Most of modern Semiconductor devices are fabricated epitaxially by
the MBE or MOCVD. In order to understand the material structure and
electronic property of buried layers, a cross-sectional surface must
be produced and studied by STM. (See the figure)
Schematic of XSTM

- Schematic shows the procedures of XSTM. Samples are cleaved in-situ
and scanned for epilayers.
Identifying (110) and (110)
by selective imaging of Ga and As sublattices

- (110) and (110) surfaces are not equivalent. XSTM can identify the
surfaces.
Ability to resolve each chemical
species for InGaAs

- In and Ga are at different energy levels. They show up with different
contrasts in the STM image
- So XSTM, cross-sectional scanning tunneling microscopy, provides
a powerful tool to explore the material structure and electronic property
of modern devices